会议专题

2008 International Workshop on Junction Technology(第六届结技术国际研讨会)

总文献量: 50篇会议类型: 国际会议会议地点: 上海主办单位: 中国电子学会会议日期: 2008-05-15
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Eztendibility of NiPt Silicide to the 22-nm Node CMOS Technology

Kazuya Ohuchi John Bruley Gilbert U.Singco Francois Pagette Anna W.Topol Michael J.Rooks James J.Bucchignano Vijay Narayanan Mukesh Khare Mariko Takayanagi Kazunari Ishimaru Christian Lavoie Dae-Gyu Park Ghavam Shahidi Paul M.Solomon Conal E.Murray Chris P.DEmic Isaac Lauer Jack O.Chu Bin Yang Paul Besser Lynne M.Gignac