会议专题

2008 International Workshop on Junction Technology(第六届结技术国际研讨会)

总文献量: 50篇会议类型: 国际会议会议地点: 上海主办单位: 中国电子学会会议日期: 2008-05-15
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Cluster Ion Implantation for beyond 45nm node novel device applications

Masayasu Tanjyo Akira Katakami Kiyoshi Shirai Toshinari Watanabe Hiroyuki Nakata Masami Kitajima Takayuki Aoyama Takahisa Eimori Yasuo Nara Yuzuru Ohji Karuppanan Saker Tsutomu Nagayama Wade Krull Dale Jacobson Thomas Horsky Nariaki Hamamoto Sei Umisedo Yuji Koga Noriaki Maehara Takao Matsumoto Nobuo Nagai Fumio Ootsuka