Computational Fluid Dynamics Simulation of Internal-Circulation Abrasive Flow Polishing
This paper is to investigate an effective approach to obtain the ultra-precision polishing of hard and brittle optical materials.A novel internal-circulation polishing method is proposed.Because the material removal rate(MRR) of abrasive flow polishing (AFP) is more dominated by shear stress than other parameters, computational fluid dynamics (CFD) simulation was used to study the shear stress distribution on the workpiece surface during AFP.The effects of some major polishing parameters are analyzed, including polishing slurry properties, pressure and the inclined angle between pipelines and workpiece surface of polishing tool.The results show that the highest shear stress can be gained by shear-thickening slurry in the three kinds of slurry.The shear stress on the workpiece surface increases with the increase of pressure and the decrease of inclined angle.This work is benefit to choosing appropriate polishing slurry and parameters.
abrasive flow polishing CFD simulation shear stress material removal rate
Xiao Liu Peng Yao Xiong Li Chuanzhen Huang
Key Laboratory of High Efficiency and Clean Mechanical Manufacture, Ministry of Education, School of Mechanical Engineering, Shandong University, Jinan 250061, CHINA
国际会议
长沙
英文
140-144
2016-11-04（万方平台首次上网日期，不代表论文的发表时间）