A novel approach to calculate the deposition uniformity of multi-target sputtering system
Since film thickness uniformity is an important performance index of the large size optical film,a novel approach was proposed to calculate the deposition uniformity of the multi-target co-sputtering system.To simplify the numerical model and characterize the non-uniform erosion of target surface,vector computation and the distribution of magnetic flux density on the target surface were introduced into the existing analytic model,respectively.Based on this model,finite element method(FEM)was adopted to calculate the deposition uniformity.To exhibit its excellent adaptability,this method was utilized to investigate the deposition uniformity of two different co-sputtering systems,including twin rectangular target co-sputtering system and triple circular target co-sputtering systems.In particular,the effects of target-substrate distance on the deposition uniformity of the two co-sputtering systems were investigated,respectively.Relative mechanism has been discussed in detail.The optimum target-substrate distances for the two co-sputtering systems have been predicted by numerical calculations.It is expected to provide a universal approach to predict the thickness distribution of the sputtered film,improving the fabrication efficiency of high-quality large size film.
Film thickness uniformity multi-target sputtering system Target-substrate distance The finite element method
Guo Zhu Jiangping Sun Zhiyin Gan
School of Mechanical Science & Engineering Huazhong University of Science & Technology Wuhan,China
国际会议
上海
英文
1372-1377
2018-08-08（万方平台首次上网日期，不代表论文的发表时间）