XPS studies of charging effect induced by X-ray irradiation on amorphous SiO2 thin films

摘要：

　　X-ray photoelectron spectroscopy has been used to investigate positive charge accumulation on amorphous SiO2 films induced by in situ X-ray irradiation.We found out two different kinds of samples.The charge accumulation at the surface affects the properties of films.Then,by examining the significant changes of chemical shift and FWHM value,the films show a character of saturation during the process and the results can trace to oxygen vacancies.From the results of loss measured before and after the irradiation,we can say that the performance of highly reflective coatings,especially the surface SiO2 thin films,will directly affect the gyro abilities.

作者: DaiPeng Xing HuiZhong Zeng WenXu Zhang WanLi Zhang

作者单位: State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 611731,China

会议类型: 国际会议

会议名称: The 2nd International Symposium on Application of Materials Science and Energy Materials (SAMSE 2018) 第二届材料科学应用与能源材料国际研讨会2018年

会议地点: 上海

会议语种:英文

页码: 1-6

在线出版日期: 2018-12-17（万方平台首次上网日期，不代表论文的发表时间）