Finite Element Analysis of Temperature Field of Electromagnetic Heating in Nitride MOCVD Reaction Chamber
In this paper,the distribution of temperature field in the reaction chamber of metal organic chemical vapor deposition(MOCVD)used for growing GaN material was simulated by finite element method.The induction heating conditions that affect the temperature distribution are analyzed,such as current frequency,current intensity,coil turns,coil spacing and the height of the base.And their influence on the temperature distribution of the substrate and their relationship with the substrate temperature are also given.The optimal design parameters of current intensity,current frequency,coil spacing,coil turns and base height are obtained by simulation.
Shigang Hu Qingyang Wu Jin Li Huiyi Cao Yanan Zhang Zhiming Li
School of Information and Electrical Engineering,Hunan University of Science and Technology,Xiangtan School of Information Science and Engineering,University of Jinan,Jinan,China
国际会议
上海
英文
1-6
2017-12-28（万方平台首次上网日期，不代表论文的发表时间）