X ray photoelectron spectroscopy(XPS)analysis of Photosensitive ZrO2 array
Based on organic zirconium source as the starting material,by adding chemical modifiers which are made up with photosensitive ZrO2 sol.A uniformed ZrO2 array dot was fabricated with a mean diameter of around 800 nm.By using UV-vis spectra and X-ray photoelectron spectroscopy analysis method,studies the photosensitive ZrO2 gel film of photochemical reaction process and the photosensitive mechanism,to determine the zirconium atom centered chelate structure,reaction formed by metal chelate Zr atom for the center,and to establish the molecular model of the chelate.And studied the ultraviolet light in the process of the variation of the XPS spectra,Zr3d5/2 to 184.9 eV corresponding to the binding energy of the Zr O C; Zr O C as the combination of state peak gradually reduce; By combining with the status of Zr-O peak gradually increase; The strength of the C O peak is gradually decline.This suggests that in the process of ultraviolet light photo chemical reaction happened.This study is of great significance to the micro fabrication of ZrO2 array not only to the memory devices but also to the optical devices.
Y.Li G.Zhao R.Zhu Z.Kou
1Advanced material analysis center,Xian University of Technology,BOX 759＃,No.5Jinhua South road,Xi Material science and engineering school,Xian University of Technology,Xian,Shaanxi,China 710048 Northwest electric power design institute of China power engineering consultinggroup,No.22 Tuanjie S
国际会议
上海
英文
1-6
2017-12-28（万方平台首次上网日期，不代表论文的发表时间）