Simulation of reactor and design of thermal insulation structure for vertical furnace
The temperature and airflow distribution of the reactor are the important factors that influence the thickness uniformity of the silicon film.In this paper,the vertical furnace reactor is studied by finite element simulation,and the thermal insulation structure is designed and tested.The influence of the temperature distribution of the silicon wafers on the bottom of the reactor is studied by changing the parameters of the thermal insulation structure.The results show that the change of the number,diameter and the material of the thermal insulation sheets have significant influence on the uniformity of the temperature of the silicon wafers.According to the thermal insulation structure determined by the experiment,the uniformity of the film thickness is guaranteed,which provides important data support for the design of the reactor.
Shuai Yang Jiannong Song Nan Sun
College of Engineering,China Agricultural University,Beijing,China
国际会议
上海
英文
1-6
2017-12-28（万方平台首次上网日期，不代表论文的发表时间）