High-Performance Intrinsic Ultralow-k Polyimide Films: Design, Synthesis and Properties
The search for new low-k dielectric materials has always been dictated by industrial needs, resulting in a strong connection between fundamental research and technology.And the acquisition of intrinsic ultralow-k materials remains one of the most important bottlenecks restricting the leapfrog development of the microelectronics industry.Here we introduce the recent advance in the research of high-performance intrinsic ultralow-k polyimide films in our lab, by considering the polarizability and the free-volume theory from the molecular level1-8.
ZHANG Yi LIU Yiwu QIAN Chao CHEN Wenxin LIU Siwei CHI Zhenguo XU Jiarui
PCFM Lab, GD HPPC Lab, Guangdong Engineering Technology Research Centre for High-performance Organic and Polymer Photoelectric Functional Films, Materials Science Institute, School of Chemistry and Chemical Engineering, Sun Yat-sen University,Guangzhou 510275, China
国际会议
the 2016 International Seminar on Advanced Materials Research(2016先进材料研究国际研讨会)
昆明
英文
180-180
2016-10-14(万方平台首次上网日期,不代表论文的发表时间)