Ion Beam Etching Technology for Thin Mirrors Stress Releasing and High Precision Processing
The deformable mirror is a key component of the adaptive optical system, which requires thin mirrors initial surface of high precision.Using the ion beam uniform scanning method, thin mirrors residual macroscopic and microscopic stress from mechanical polishing can be effectively reduced much.At the same time, surface precision is improved by strong machining ability of the ion beam figuring (IBF).After releasing the stress, the surface changes and exits mainly out-of-focus aberration.Stable removal function is processed by four-point method.Through three times figuring,the surface accuracy raises to the PV value of 0.151 λ, (95.2 nm) and RMS value of 0.019 λ (12.2 nm).The ion beam etching technology provides a new method for surface precision improving of thin mirrors.
Uniform scanning Ion beam figuring Residual stress Thin mirror
Zhanbin Fan Yifan Dai Chaoliang Guan Guipeng Tie Furen Li
College of Mechatronics Engineering and Automation, National University of Defense Technology,Changsha, Hunan, 410073, China;Hunan Key Laboratory of Ultra-Precision Machining Technology, Changsha, 410073, China
国际会议
上海
英文
11-15
2017-11-19（万方平台首次上网日期，不代表论文的发表时间）