Recent Progress in High-Performance Intrinsic Ultralow-k Polyimide Films
The search for new low-k dielectric materials has always been dictated by industrial needs, resulting in a strong connection between fundamental research and technology.And the acquisition of intrinsic ultralow-k materials remains one of the most important bottlenecks restricting the leapfrog development of the microelectronics industry.Here we introduce recent advance in the research of high-performance intrinsic ultralow-k polyimide films in our lab, by considering the polarizability and the free-volume theory from the molecular level.1-8 The intrinsic ultralow-k property was obtained by the molecular design and the control of the steric and aggregation structure of the polymers, which led to the formation of uniform distributed free-volume holes with sizes at the (A)ngstr(o)m scale, measured by positron annihilation lifetime spectroscopy (PALS).Such a strategy is beneficial for lowering the k value and simultaneously maintaining the overall properties of polyimide, such as excellent mechanical properties,thermal properties, and good processing properties.
Yi Zhang Chao Qian Yiwu Liu Runxin Bei Wenxin Chen Zhenguo Chi Siwei Liu Jiarui Xu
PCFM Lab, GD HPPC Lab, Guangdong Engineering Technology Research Centre for High-performance Organic and Polymer Photoelectric Functional Films, State Key Laboratory of Optoelectronic Materials and Technologies, School of Chemistry and Chemical Engineering, Sun Yat-sen University, Guangzhou 510275, China
国际会议
9th International Symposium on High-Tech Polymer Materials(第9届国际高技术高分子材料学术会议)(HTPM-9)
郑州
英文
59-59
2016-07-11（万方平台首次上网日期，不代表论文的发表时间）