Multi-fluorinated Polyphenylquinoxalines with Low Dielectric Constants and high Dielectric Breakdown Strength: Synthesis and Characterization
Polymer interlayer dielectrics (ILDs) with low dielectric constant (low-k) and low dissipation factor features have been paid increasing attention in ultra-large scale integrated circuit (ULSI) fabrication due to their abilities to lower the line-to-line noise in interconnects and alleviate power dissipation issues by reducing the capacitance between the interconnect conductor lines so as to achieve faster signal transmission speed 1.Polyimides (PIs) have been investigated more extensively as high performance ILDs than most other polymers.However, conventional PI dielectrics usually show k values higher than 3.0, which cannot meet the future requirement for advanced ULSI fabrication 2.
Jin-gang Liu Mian Ji Hai-xia Yang Shi-yong Yang
School of Materials Science and Technology, China University of Geosciences, Beijing 100083,China;La Laboratory of Advanced Polymer Materials, Institute of Chemistry, Chinese Academy of Sciences,Beijin
国际会议
9th International Symposium on High-Tech Polymer Materials(第9届国际高技术高分子材料学术会议)(HTPM-9)
郑州
英文
110-112
2016-07-11（万方平台首次上网日期，不代表论文的发表时间）