Design and Analysis of a Precise Adjustment Mechanism for Lithography Objective Lens Based on Slit Diaphragm Flexure

摘要：

　　An adjustment mechanism with three degrees of freedom (hx-hy- Z) based on slit diaphragm flexure is designed to meet the requirement of high precise adjustment and guidance accuracy for the application in lithography objective lens.The stiffness formulas of the adjustment mechanism are derived by elastic mechanics,and verified by finite element simulation.The effect of the adjusting force acts on the surface figure of the optical element is also analyzed.The results show that the stiffness ratio between the radial direction and axial direction is 1534.6,the error between the theoretical value and simulation value of the axial stiffness is 6.07 %,and 8.33 % for the radial stiffness,which indicates the validity of the stiffness calculation.During the axial adjustment process,the adjusting force mainly introduces defocus,spherical and trefoil aberration.However,during the tilt adjustment process,the adjusting force mainly introduces astigmatism,coma and trefoil aberration.

关键词： Lithography objective lens Adjustment mechanism Slit diaphragm flexure Guidance accuracy Surface figure

作者: Shize Dong Kang Guo Xianling Li Huanan Chen Mingyang Ni

作者单位: State Key Laboratory of Applied Optics, Engineering Research Center of Extreme Precision Optics, Cha State Key Laboratory of Applied Optics, Engineering Research Center of Extreme Precision Optics, Cha

会议类型: 国际会议

会议名称: 2016中国机构与机器科学国际会议

会议地点: 广州

会议语种:英文

页码: 403-414

在线出版日期: 2016-12-15（万方平台首次上网日期，不代表论文的发表时间）