Realize the Concentric Circles Pattern based on Two-Surface-Plasmon-Polariton Absorption Photolithography

摘要：

　　Based on a photolithography method with two-surface-plasmon-polariton-absorption effect,a concentric-circle pattern with linewidth of~70nm is realized under the exposure of 400nm femtosecond laser.The pattern is promising of realizing optical devices of light field gathering or bio-sensing.

关键词： Surface plasmon polariton photolithography break the diffraction limit concentric circles

作者: Weisi Meng Fang Liu Weijun Zhang Yu Ye Yidong Huang

作者单位: Department of Electronic Engineering,Tsinghua National Laboratory for Information Science and Technology,Tsinghua University,Beijing 100084,China

会议类型: 国际会议

会议名称: 2014 Asia Communications and Photonics Conference(ACP2014)(2014亚洲通信与光子学大会)

会议地点: 上海

会议语种:英文

页码: 1-3

在线出版日期: 2014-11-11（万方平台首次上网日期，不代表论文的发表时间）