GaN Nano-membrane for Optoelectronic and Electronic Device Applications
The~25nm thick threading dislocation free GaN nanomembrane was prepared using ultraviolet electroless chemical etching method offering the possibility of flexible integration of (Al,In,Ga)N optoelectronic and electronic devices.
Boon S.Ooi Rami T.ElAfandy Ahmed B.Slimane M.Abdul Majid Tien Khee Ng
Photonics Laboratory,King Abdullah University of Science and Technology(KAUST),Thuwal 21534,Saudi Arabia
国际会议
2014 Asia Communications and Photonics Conference(ACP2014)(2014亚洲通信与光子学大会)
上海
英文
1-3
2014-11-11(万方平台首次上网日期,不代表论文的发表时间)