Adaptive EWMA Controller based on Dynamic Modeling in Semiconductor Manufacturing

摘要：

　　In semiconductor manufacturing,it is important to produce multiple products on the same equipment to enhance the overall equipment effectiveness so as to improve the productivity.However,the “high-mix production is difficult to control due to the time-varying model.To address this problem,an adaptive exponentially weighted moving average(EWMA)control method of which the core content is online dynamic modeling is put forward.During dynamic modeling process,the noise disturbance can be predicted through EWMA controller; meanwhile,the process gain can be estimated by using the predicted noise disturbance.Case studies of the chemical mechanical polishing(CMP)unit operation show the efficacy and the attractiveness of the strategy.

关键词： Adaptive EWMA Control “High-mix Production Online Dynamic Modeling

作者: Ge Cuicui Chen Liang Wang Feilong

作者单位: College of Mechanical-Electrical Engineering,Soochow University,Suzhou Jiangsu,215021,China

会议类型: 国际会议

会议名称: 第26届中国控制与决策会议(2014 CCDC)

会议地点: 长沙

会议语种:英文

页码: 1228-1232

在线出版日期: 2014-05-31（万方平台首次上网日期，不代表论文的发表时间）