MBE Growth of Bi2Te3 for Thermoelectrics
Molecular beam epitaxy of Bi2Te3 on various substrates for thermoelectric applications is investigated.Growth conditions were optimized based on Si(111)substrates with two different growth techniques,co-deposition followed by crystallization and direct growth.Growth of Bi2Te3 on GaAs,GaN,et.al.substrates with different crystal directions and offcut angles were investigated.High quality Bi2Te3 thin films were achieved with very low carrier density and record high carrier mobility.
Yuxin Song Sophie Charpentier Attila Fül(o)p Maria Ekstr(o)m Luca Galletti Thilo Bauch Floriana Lombardi Shumin Wang
Department of Microtechnology and Nanoscience,Chalmers University of Technology,Gothenburg,Sweden;St Department of Microtechnology and Nanoscience,Chalmers University of Technology,Gothenburg,Sweden Università degli Studi di Napoli Federico II,Physical Science department,via Cinthia I-80126 Napoli,
国际会议
北京
英文
1-3
2013-11-12(万方平台首次上网日期,不代表论文的发表时间)