Thermal Stability and Tribological Properties of Fluorinated Amorphous Carbon Thin Films Doped with Nitrogen

摘要：

　　Nitrogen doped fluorinated amorphous carbon thin films(a-C:N:F)were prepared by radio frequency plasma enhanced chemical vapor deposition(rf-PECVD)under different deposited condition using CH4,CF4,and N2 as source gases.The thin films were annealed at different temperature.The influence of doped nitrogen on the chemical structure,tribological and thermal properties of thin films were investigated by Atomic force microscopy(AFM),Fourier transform infrared absorption spectrometry(FTIR),X-ray photoelectron spectrum spectra(XPS),and thermogravimetry(TG).The results indicated that the thin films presence a compact and smooth morphology surface after the nitrogen doped.After incorporation of nitrogen,the H atoms are replaced partially by the N atoms in the thin films.The degree of cross-linking of the carbon network in the thin films is enhanced.The chemical bonds of C=N,CN,and C—Nx(x=1,2,3)have formed in the films.The relative content of sp2 graphite phase increases.The thermal stability temperature of the films deposited at r=0.5(r=N2/CF4+CH4+N2)is 420 ℃.The tribological properties improve greatly,and the friction coefficient of the a-C:N:F thin films ranges approximately from 0.20 to 0.36.

关键词： a-C:N:F thin films FTIR chemical structure thermal stability tribological properties

作者: XIAO Jian-rong JIANG Ai-hua YANG Duan-cui JIANG Hao-yu

作者单位: College of Science,Guilin University of Technology,Guilin,541004,China

会议类型: 国际会议

会议名称: The 7th International Conference on Electromagnetic Processing of Materials(第七届冶金与材料电磁过程国际大会)

会议地点: 北京

会议语种:英文

页码: 1-4

在线出版日期: 2012-10-22（万方平台首次上网日期，不代表论文的发表时间）