Influence of the Silicon Ion Beam Impact on the Physical,Chemical and Topographical Surface Properties of a Binary NiTi-base Alloy

摘要：

　　Change of the physical, chemical, and topographical properties of the NiTi alloy specimen sur face layers after surface modification by means of Si ion beams were studied in the work.It was found that the NiTi-Si layer thickness formed after ion implantation at a depth of ~ 10 nm below a modified surface is Ah ≈ 70 nm.No nickel atoms were observed on the specimen surface or in a subsurface layer Ah ≈ 20 nm in thick ness.After ion beam treatmem the specimen surface was substantially fragmented as the size of the structure elements (fragments) in the substructure of the main phase of the alloy was reduced down to 100-300 nm.

关键词： binary NiTi-base alloy high-dose ion implantation silicon surface modification

作者: S.N.Meisner A.V.Tverdichlebova L.L.Meisner A.I.Lotkov

作者单位: Institute of Strength Physics and Materials Science of the Siberian Branch of the Russian Academy of Sciences,Tomsk,Russia

会议类型: 国际会议

会议名称: The 12th China-Russia Symposium on Advanced Materials and Technologies(第十二届中俄双边新材料新工艺国际会议)

会议地点: 昆明

会议语种:英文

页码: 299-302

在线出版日期: 2013-11-19（万方平台首次上网日期，不代表论文的发表时间）