Structure and Properties of the TiCuN coating-AI-Si Substrate System Treated by a High-intensity Electron Beam

作者: Yu.F.Ivanov E.A.Petrikova A.D.Teresov N.N.Cherenda N.V.Bibik

作者单位: Institute of High Current Electronics SB RAS,Tomsk,Russia;National Research Tomsk Polytechnic Univer Institute of High Current Electronics SB RAS,Tomsk,Russia Belarusian State University,Minsk,Belarus

会议类型: 国际会议

会议名称: The 12th China-Russia Symposium on Advanced Materials and Technologies(第十二届中俄双边新材料新工艺国际会议)

会议地点: 昆明

会议语种:英文

页码: 331-335

在线出版日期: 2013-11-19（万方平台首次上网日期，不代表论文的发表时间）