Investigation of time instability factors in Ti-SbxTe based phase change memory
In this paper, the two time instability factors in phase change memory, amorphous resistance drift and spontaneous crystallization process, are studied based on Ti2.75(SbxTe)97.25 and Ti6.85(SbxTe)93.15.The drift coefficients of both components are calculated and compared under room temperature.The reason why the drift coefficient decreases with the Ti concentration increases is discussed based on the band structure model of amorphous phase change materials.And the data retention change trend is also presented.The experiment results and the physical explaination can also be extended to other metallic element doped SbxTe alloy phase change materials.
phase change material time instability amorphous resistance drift data retention
Xinglong Ji Liangcai Wu Feng Rao Zhitang Song Min Zhu Songlin Feng
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and
国际会议
The Eighth China National Conference on Functional Materials and Applications(第八届中国功能材料及其应用学术会议)
哈尔滨
英文
825-830
2013-08-23(万方平台首次上网日期,不代表论文的发表时间)