Atomic layer deposition (ALD) technology is a self-limiting ultrathin film deposition method.In ALD reactions,the reaction temperature plays a key role.And generalized predictive control (GPC) algorithm is adopted to control the temperature of a radiant heating reactor.The mathematical model of the system’s temperature uniformity is calculated with heat transfer theory.Since temperature control is affected by GPC parameters including soften factor,weighting coefficient,sample time etc,it is necessary to study the effect of these parameters.By experiments,the values of soften factor,weighting coefficient and sampling time could be optimized and then be applied in the process of ALD reactions.And conclusions can be draw that soften factor has the largest impact on the algorithm while the influences of weighting coefficient and sampling time are almost negligible.Efficient temperature control of the ALD reactor chamber using GPC algorithm with optimal parameters is demonstrated.
Atomic Layer Deposition (ALD) Generalized Predictive Control (GPC) CARMA model soften factor weighting coefficient radiant heating
Wenjie He Bo Chu Rui Gu Haitao Zhang Bin Shan Rong Chen
State Key Laboratory of Digital Manufacturing Equipment and Technology,Wuhan, Hubei, China, 430074;S School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, State Key Laboratory of Digital Manufacturing Equipment and Technology,Wuhan, Hubei, China, 430074;S State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science