Investigate the Characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 Films at Various Deposition Temperatures
0.65(K0.5Bi0.5)TiO3-0.35BaTiO3 (KBT-BT3) ceramics were synthesized using a two-step calcination process that combined hydrothermal and conventional calcination processes.After sintered into ceramic target, KBT-BT3 films were deposited on Pt/Ti/Si and SiO2/Si/Al substrates by radio frequency magnetron (RF) sputtering at various temperatures.The surface morphologies and thicknesses of KBT-BT3 films were characterized by field emission scanning electron microscopy, and the thickness increased with increasing deposition temperature.XRD patterns showed that all KBT-BT3 films were amorphous and higher deposition temperature had no apparent effects to improve the crystalline orientation.The effects of deposition temperatures on the properties of the current-electric filed, polarization-applied electric field, and capacitance-voltage curves were also investigated.As deposition temperatures of KBT-BT3 films increased from room temperature to 400℃, the leakage current density had no apparent variation but the threshold voltage was shifted to lower value.The theorems for the effects of deposition temperature on the properties of KBT-BT3 films were also investigated.
0.65(K0.5Bi0.5TiOa)-0.35BaTiO3 C-V curve Ⅰ-Ⅴ curve P-E curve
W.C.Tzou C.G.Kuo P.S.Cheng Y.H.Lin C.F.Yang
Department of Electro-Optical Engineering,Southern Taiwan University,Tainan,Taiwan Department of Industrial Education,National Taiwan Normal University.Taipei,Taiwan Department of Electronic Engineering,National Kaohsiung University of Applied Sciences,Kaohsiung,Tai Department of Chemical and Materials Engineering,National University of Kaohsiung,
国际会议
香港
英文
372-376
2013-06-25（万方平台首次上网日期，不代表论文的发表时间）