Magnetron Sputtering Target Structure Optimization Research Status

摘要：

　　In order to optimize the target surface magnetic field intensity and uniformity for the purpose, this paper introduces the traditional magnetron sputtering target problems, the author summarizes the other researchers on magnetron sputtering target field overall optimization ideas, magnetic field simulation method and different target under the condition of the magnet structure optimization, especially in rectangular target end area optimization are summarized, and the magnetron sputtering target magnetic field pole shoe and permeability piece optimization also made a description.

关键词： Target material utilization ratio magnetic field uniformity Magnetic field intensity Structure optimization

作者: LIN Jing ZHANG Jin-long YU Gui-wen

作者单位: Harbin University of Commerce, Harbin 150028, China

会议类型: 国际会议

会议名称: 2013 International Conference on Machinery,Materials Science and Energy Engineering(2013机械、材料科学与能源工程国际会议)(ICMMSEE2013)

会议地点: 湖北荆州

会议语种:英文

页码: 356-359

在线出版日期: 2013-05-18（万方平台首次上网日期，不代表论文的发表时间）