Investigation on AZO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

摘要：

　　The Al2O3-doped ZnO(AZO) films were deposited on the glasses by means of RF magnetron sputtering technology.The films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD) and Profile-system respectively.The effect of substrate temperature on the structure of the AZO films is investigated.As a result, the properties of the AZO thin films are remarkably influenced by the substrate temperature, especially in the range of 200℃ to 500 ℃.The film prepared at the substrate temperature of 400℃ possesses the best crystalline.

关键词： Magnetron Sputtering AZO Films Substrate Temperature

作者: Cheng-long Kang Jin-xiang Deng Min Cui Chao Man Le Kong Ping Yang

作者单位: School of Applied Mathematics and Physics,Beijing University of Technology,Beijing,China,100124

会议类型: 国际会议

会议名称: 2012 China Functional Materials Technology and Industry Forum(2012中国功能材料科技与产业高层论坛)(CFMTIF2012)

会议地点: 昆明

会议语种:英文

页码: 35-39

在线出版日期: 2012-11-09（万方平台首次上网日期，不代表论文的发表时间）