Electrodeposition of ZnO Thin Films with Controllable Impurities And Microstructures
To enhance the conductivity and reduce the surface roughness of ZnO films, electrodeposition of ZnO films on the ITO substrate had been studied for the application of inverted organic solar cells.ZnO films with the grain size range from 0.4 to 2 μm had been fabricated by varying the temperature, ion concentration and deposition potentials.Moreover, ZnO films with the impurity energy level of 2.28± 0.20 eV origin from the oxygen vacancy, had been found in the PL emission.It is found that as the applied potential went more negative, the concentration of the oxygen vacancies increased, and the emission peak of the impurity level had higher intensity.By changing the ion concentration and temperature of the electrolyte, the controllable microstructure and impurity levels of ZnO thin films had been achieved.
Eletrodeposition ZnO film Impurity Oxygen vacancy
Xu Chen Zhu Liu De-Ying Luo Jun-Jie Li Xu Wang Yuan-Fei Feng Zhe Xu Hui Xiao Jia-Xiu Man Yong-Jun Liu
School of physics science and technology Yunnan University,Kunming City,Yunnan Province,China 650091 Advanced Analysis and Measurement Center of Yunnan University,Kunming City,Yunnan Province,China 650
国际会议
2012 China Functional Materials Technology and Industry Forum(2012中国功能材料科技与产业高层论坛)(CFMTIF2012)
昆明
英文
196-201
2012-11-09（万方平台首次上网日期，不代表论文的发表时间）