Role of Sputtering Power on the structural and optical properties of ZnOISiO2 Films deposited by radio frequency magnetron sputtering

摘要：

　　In the present work,we investigated the effect of sputtering power on the structural and optical properties of ZnO films by radio frequency (rf) magnetron sputtering.Atom force microscopy(AFM),X-ray diffraction(XRD) and Prism coupling method were adopted to investigate the structure and optical properties of ZnO thin films deposited by sputtering powers in the range from 100~150W.XRD and AFM results shown that ZnO films with high c-axis preferred orientation crystalline structures have been successfully deposited under higher sputtering power condition.Moreover,it was also found that the indexes refractive of the films obtained by higher sputtering power are less than that of the bulk ZnO materials,which is closer to Crystal Refractive index.

关键词： ZnO films waveguide X-ray diffraction c-axis orientation

作者: Shuang Li Ming Chen Feng-xiang Wang

作者单位: School of Computer,Shandong Xiehe University,Jinan,250107,China;School of Physics,Shandong Universit School of Physics,Shandong University,Jinan 250100,China School of Science,Shandong Jianzhu University,Jinan 250101,China

会议类型: 国际会议

会议名称: 2013 2nd international Conference on Opto-Electronics Engineering and Materials Eesearch(2013第二届光电工程与材料研究国际会议)(OEMR2013)

会议地点: 郑州

会议语种:英文

页码: 36-39

在线出版日期: 2013-10-19（万方平台首次上网日期，不代表论文的发表时间）