Crack Healing Behavior of SiN/SiC Nano-Laminated Films
We investigated the self-crack-healing behavior of SiN/SiC nano-laminated film. Moreover, we discussed the healing condition including heating temperature and heating time. The films were deposited on a silicon substrate using an ion-beam-assisted deposition. The SiN/SiC nano-laminated film was fabricated with alternating layers of SiN and SiC. After the deposition, a pre-crack was introduced using a Vickers indentor. Then, the cracked samples were heated using an electric furnace in an air atmosphere at the temperature of 600 °C to 1200 °C. In the case of the SiN and SiC monolayer films, the crack was poorly healed after heating irrespective of the temperature. This was because the size of the crack opening increased after heating. On the other hand, slight crack healing occurred at the temperature of 600 °C. Crack healing improved with an increase in the heating temperature and time. From these results, we concluded that SiN/SiC nano-laminated film has a superior self-crack-healing ability.
Self-healing Thin film Crack High temperature Oxidation
Masanori Nakatani Junki Nishimura Satoshi Hanaki Hitoshi Uchida
Department of Mechanical Engineering,University of Hyogo,Himeji,671-2280,Japan Graduate Student,Department of Mechanical Engineering,University of Hyogo,Himeji,671-2280,Japan
国际会议
北京
英文
1-6
2013-06-16（万方平台首次上网日期，不代表论文的发表时间）