Refractive Index Estimation of Nanoporous Silicon in Visible and Near-infrared Spectrum Range

摘要：

　　In this paper,we use Bruggeman model to calculate refractive index of nanoporous silicon,which was fabricated by electrochemical etching.The calculated result shows that the refractive index of the nanoporous silicon decreases linearly with increasing porosity and etching current density.In addition,the refractive index of nanoporous silicon was also measured by spectroscopic ellipsometry in the visible light spectrum range.The measured refractive index and extinction coefficient were in agreement with the calculated data,after being modified by the refractive index modified model of heavily doped silicon.In particular,we estimate the refractive index at the optical wavelengths in visible and near-infrared spectrum ranges,which may be widely used in various types of optical sensors and optoelectronic devices for optical communication systems.

关键词： Nanoporous silicon Refractive index Extinction coefficient

作者: Wei Qiang Jin An Xia Chun Rui Wang Xiao Yan Zhang

作者单位: Department of Applied Physics and State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, Donghua University, 2999 Renmin Rd.North, Songjiang District, Shanghai, 201620, P.R.China

会议类型: 国际会议

会议名称: 2nd International Conference on Polymer Composities and Polymer Testing (2013第二届高分子复合材料与高分子测试国际会议暨先进工业技术与方案国际会议)(ISPCPT2013)

会议地点: 太原

会议语种:英文

页码: 535-539

在线出版日期: 2013-03-22（万方平台首次上网日期，不代表论文的发表时间）