A novel ZnO-based graphite-insulator-semiconductor diode for transferable unipolar electronic devices
In this paper,a novel ZnO-based graphite-insulator-semiconductor (GIS) diode was fabricated on graphite substrate by radio frequency (rf) magnetron sputtering.A SiO2 thin film was used as the insulator layer grown by electron beam evaporation technique.The measurement of current-voltage of the ZnO-based GIS diode showed a Schottky rectifying diode characteristic with a threshold voltage of 5.2 V and a poor leakage current of~10-3 A under a reverse bias condition.An interesting negative capacitance phenomenon was also observed from the GIS diode.The successful fabrication of ZnO-based GIS diode on graphite substrate offers the significant opportunity to be readily transferred onto any rigid or flexible foreign substrates,since the graphite substrate consists of weakly bonded layer structure.
ZnO Semiconductor Unipolar Electronic Devices Negative Capacitance Transferable Devices
Zhikun Zhang Jiming Bian Xiaoqiang Kou
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, Liaoning, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, Liaoning,
国际会议
太原
英文
564-567
2013-03-22(万方平台首次上网日期,不代表论文的发表时间)