Optimum Structure of multi-layer silver superlenses for optical lithography

摘要：

　　Multilayer silver superlenses had been shown to having sub-wavelength performance.In this paper,we investigate the effects on imaging performance of different multilayer imaging structures comprising alternately layered metal and dieleetric films.We first compare and analyze transmission coefficients of different structures by changing the layer thickness ratio,the total thickness of the layers and the dielectric materials.Then we simulate the imaging performance by the finite difference time domain (FDTD)method of these multilayered superlenses.According to the analyzing and simulated results,a multilayer silver superlens with optimum structure is suggested.

关键词： Superlens Surface plasmons Photolithography Imaging performance

作者: Junxian Ma Kuangying Yuan

作者单位: Advanced Technology Research Centre Shenzhen University Shenzhen,China

会议类型: 国际会议

会议名称: 2013 2nd International Conference on Computer Science and Electronics Engineering(ICCSEE2013)(2013年第二届计算机科学与电子工程国际会议)

会议地点: 杭州

会议语种:英文

页码: 1319-1322

在线出版日期: 2013-03-22（万方平台首次上网日期，不代表论文的发表时间）