Characteristics of BiFeO3 thin films on a LaAlO3 substrate by RF sputtering
In this paper,BiFeO3 (BFO) films were grown on LaAlO3 (LAO) substrate by a RF magnetron sputtering system.Fabrication parameters,such as work pressure,sputtering atmosphere,and post annealing were examined in terms of their influences on characteristics of the ferroelectric films.X-Ray diffraction,Raman scattering and scanning electron microscope measurements were employed to characterize the microstructure and the morphology of these films.At last,the ferroelectric characteristic of BFO has been studied,and the film has a large saturated polarization of 40 μC / cm2 under an applied field of 12 kV/cm.
BiFeO3 thin film ferroelectric
Jian Cao Jie Xing Bin He Ziyang Zhang Yanting Duan Jiangfan Gu
School of Science, China University of Geosciences, Beijing 100083, China;School of Geophysics and I School of Science, China University of Geosciences, Beijing 100083, China School of Geophysics and Information Technology, China University of Geosciences, Beijing 100083, Ch
国际会议
北京
英文
64-68
2012-12-16(万方平台首次上网日期,不代表论文的发表时间)