Quantum state in fabricating Silica Antireflective Coatings

摘要：

　　Based on TEOS system and sol-gel process,together with catalysts,Antireflective coating films prepared by sol—gel on glass substrate have been processed by rapid thermal annealing (RTA).the refractive index and thinkness of SiO2 film is exactly controlled.The films are characterized by ellipsometer and SEM respectively.The quantum states in these processions are found and discussed.

关键词： Quantum state Antireflective coating, Rapid thermal annealing

作者: Ruimin Jin Zhiduan Cai Limin Cang Tao Yan

作者单位: Institute of Solar Cell Nanyang Institute of Technology, Henan 473004, China;Postdoctoral workstatio Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China

会议类型: 国际会议

会议名称: 3rd International Conference on Frontiers of Manufacturing and Design Science(第三届制造与设计科学前沿国际会议(ICFMD))

会议地点: 香港

会议语种:英文

页码: 247-250

在线出版日期: 2012-12-11（万方平台首次上网日期，不代表论文的发表时间）