Surface uniformity of CVD diamond film polishing by catalytic polishing method

摘要：

　　CVD diamond is the main trend of future diamond materials.Surface uniformity of CVD diamond film polishing is one of the key technologies to expand the application of CVD diamond.Based on the catalytic polishing method,rotation velocity of the planet wheel is achieved when the lapping plate is in different rotation velocity and different bias distance by mechanics analysis.The lapping surface uniformity is analyzed to find out the best bias distance and velocity ratio by simulating the lapping times of different CVD diamond film with different velocity ratio and bias distance.At last,the lapping planet velocity and bias distance are achieved when polishing is in the best condition.The high uniformity surface can be achieved when polishing is carried out in these parameters.

关键词： surface uniformity CVD diamond catalytic polishing

作者: Difeng Zhou Xiulian Zheng Chen Ruan Li Zhang

作者单位: Key Laboratory of Special Purpose Equipment and Advanced Processing Technology(Zhejiang University o Department of Information and Electrical Engineering,West Branch of Zhejiang University of Technolog Ningbo Entry-exit Inspection and Quarantine Bureau of P.R.C,Ningbo 315012,China

会议类型: 国际会议

会议名称: the 2012 National Conference on Digital Design and Manufacturing Technology (2012年全国数字化设计与制造技术会议(DDMTC 2012))

会议地点: 宁波

会议语种:英文

页码: 102-106

在线出版日期: 2012-11-12（万方平台首次上网日期，不代表论文的发表时间）