LED production yield improvement using advanced in-situ metrology systems
Currently the LED industry is heading towards a period of competitive consolidation.As LED performance and efficiency are already sufficient to outrun all conventional light sources,leading players in the field are now targeting a rigorous cost reduction due to the rapidly decreasing cost per lumen.Especially the epitaxial LED growth process provides significant cost reduction potential by increasing the MOCVD tool capacity and throughput combined with larger wafer sizes and well-prized silicon wafers.These measures require advanced in-situ monitoring to improve production yield and ensure process stability.Here we focus on tight control of LED growth for process optimization using advanced in-situ metrology.
LED MOCVD in-situ monitoring process quality control production cost reduction
Tom Thieme Stephanie Fritze
LayTec AG, Seesener Str.10-13, 10709 Berlin, Germany
国际会议
9th China International Forum on Solid State Lighting(第九届中国国际半导体照明论坛)
广州
英文
36-38
2012-11-05（万方平台首次上网日期，不代表论文的发表时间）