Using Process Control Software to Improve the Epitaxial Process

摘要：

　　Fault Detection & Classification,Run to Run process control,and Yield Management provide manufacturers with the ability to effectively manage fleets of MOCVD reactors.FDC provides automatic data monitoring,analysis and reporting,in addition to the immediate notification of process excursions.Run to run process control bolsters yield by removing human subjectivity and error in the form of operator to operator differences,miscalculations of new set-points,and incorrect adjustments.YMS provides the ability to analyze device fabrication from start to finish,enabling engineers to identify previously-unknown yield loss mechanisms and pinpoint when and where yield loss is occurring.

关键词： MOCVD LED process control software epitaxy FDC Run-to-Run YMS

作者: Matthew Chriss

作者单位: Rudolph Technologies, Inc., One Highwood Drive, Suite 102, Tewksbury, Massachusetts, 01876 USA

会议类型: 国际会议

会议名称: 9th China International Forum on Solid State Lighting(第九届中国国际半导体照明论坛)

会议地点: 广州

会议语种:英文

页码: 39-42

在线出版日期: 2012-11-05（万方平台首次上网日期，不代表论文的发表时间）