A Review on Fabrication Methods of BiFeO3 Thin Films
BiFeO3 is a very promising multiferroic materials,which can present ferroelectric and antiferromagnetic properties at room temperature (Tn=643 K,Tc=1103 K).Because the fabrication methods of BiFeO3 films play a significant role on their properties,various processing techniques have been developed in recent years for the preparation of such films.In this paper,the main fabrication processes on BiFeO3 thin films were reviewed,including two important chemical processes,chemical solution deposition and metal-organic chemical vapor deposition,and two commonly applied physical processes,pulsed laser deposition and radio-frequency magnetron sputtering.
BiFeO3 Thin films Fabrication
Yaoting Huang Xiuli Fu Xiaohong Zhao Weihua Tang
School of Science,Beijing University of Posts and Telecommunications,Beijing 100876,P.R.China
国际会议
景德镇
英文
81-86
2012-10-15(万方平台首次上网日期,不代表论文的发表时间)