Study on chemical mechanical ultra precision process technology of Aluminum Interconnected Line for ULSI

摘要：

　　The chemical mechanical polishing ultra precision process technology mechanism of Aluminum Interconnected Line for ULSI was analyzed according the physical and chemical properties of Aluminum.In order to meet the request of environmental protection and reducing ion staining,the alkaline slurry was adopted.The selection reason of pH value regulator and surfactant was discussed,and their actions during polishing were analyzed.According to the experimental results and optimal technological parameters,the higher removal rate and lower surface roughness were gotten,which were 390nm/min and 0.47nm respectively.

关键词： ULSI Aluminum interconnection line Chemical mechanical polishing

作者: Niu Xin Huan Wang Juan Sun ming Tan Baimei Gao Baohong

作者单位: Institute of Microelectronics,Hebei University of Technology,Tianjin,300130,China

会议类型: 国际会议

会议名称: the 2nd International Conference on Electronic & Mechanical Engineering and Information Technology (EMEIT-2012)(2012年电机工程与信息技术国际会议)

会议地点: 沈阳

会议语种:英文

页码: 1491-1494

在线出版日期: 2012-09-26（万方平台首次上网日期，不代表论文的发表时间）