Characterization of Nanoline Based on SEM Images

摘要：

　　In this paper,nanolines are fabricated on photoresist using electron beam lithography (EBL) technique.The trapeziform of the cross-section is studied through analysis of the top-down scan electron microscope (SEM) image of the nanolines.Width is not adequate to describe the nanolines.From the SEM image it can be observed that the edge of the nanolines is not straight.Fractal dimension is used to describe the line-edge roughness (LER) of the nanolines.Three different methods are used to calculate the width of the nanolines.Comparing three different values and uncertainty,the true value of the nanolines has been found.

关键词： Nanoline SEM Line width Line-edge roughness Fractal dimension

作者: Chen-ying Wang Shu-ming Yang Qi-jing Lin Zhuang-de Jiang

作者单位: State Key Laboratory for Manufacturing Systems Engineering, Xian Jiaotong University, Xi’an,710049, State Key Laboratory for Manufacturing Systems Engineering, Xian Jiaotong University, Xi’an,710049, State Key Laboratory for Manufacturing Systems Engineering, Xian Jiaotong University, Xi’an,710049,

会议类型: 国际会议

会议名称: 2012第八届精密工程测量和仪器仪表国际研讨会(ISPEMI2012)

会议地点: 成都

会议语种:英文

页码: 1-6

在线出版日期: 2012-08-08（万方平台首次上网日期，不代表论文的发表时间）