会议专题

Optimal configuration for the dual rotating-compensator Mueller matrix ellipsometer

  The dual rotating-compensator Mueller matrix ellipsometer based on the optical configuration PC1r(ω1)SC2r(ω2)A has been developed recently with many applications such as characterization of thin film growth and surface modification.In this paper,the optimal configuration of this ellipsometer is performed by minimizing the condition number of the systematic data reduction matrix.We present the optimal orientation angles of the polarizer (P) and the analyzer (A),as well as the optimal number of sampling points and the optimal retardance of both compensators,and find that these optimal configurations at different frequency ratios of the two compensators (C1r and C2r) yield almost equal performance.Simulations conducted on this ellipsometer with different parameters have demonstrated that the optimal configuration improves the measurement accuracy.

Mueller matrix ellipsometer (MME) Mueller matrix polarimeter optimal configuration condition number

Weichao Du Shiyuan Liu Chuanwei Zhang Xiuguo Chen

Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology,Wuhan 4 Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology,Wuhan 4 State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Scien

国际会议

2012第八届精密工程测量和仪器仪表国际研讨会(ISPEMI2012)

成都

英文

1-7

2012-08-08(万方平台首次上网日期,不代表论文的发表时间)