Design of a synchronization control system for lithography based on repetitive control method

摘要：

　　A repetitive control theory is proposed to solve the synchronization problem between the wafer stage and reticle stage.A macro-micro control method is used based on a macro-micro control structure in which a linear motor is combined with a voice coil motor.A synchronization controller of the reticle stage is added base on the conventional PID control system.The repetitive controller is designed based on the repeated movement of the reticle stage and the wafer stage during the scan and exposure period,and the effects of synchronization control system can be improved because of the repetitive control can effectively track and inhibit the periodicity excitation signal.The repetitive control system effectively reduces the synchronization error during the scan and exposure period,in the meanwhile keep the tracking accuracy and dynamic characters.Simulation results show that the synchronization error can be reduced effectively.

关键词： synchronization control repetitive control master-slave control lithography

作者: Hao Zhongyang Peng Guiyong Li Xin Chen Xinglin

作者单位: Department of Control Science and Engineering, Harbin Institute of Technology, Harbin, 150001,China School of Control and Computer Engineering, North China Electric Power University, Beijing,102206,Ch

会议类型: 国际会议

会议名称: 2012第八届精密工程测量和仪器仪表国际研讨会(ISPEMI2012)

会议地点: 成都

会议语种:英文

页码: 1-8

在线出版日期: 2012-08-08（万方平台首次上网日期，不代表论文的发表时间）