An Improved Edge Extraction Algorithm for Lithography Micrographs

摘要：

　　For shape error analysis and correction of micro-structure in lithography, image edges should be extracted from micrographs of the structures.First several basic image edge detection algorithms are analyzed and compared.Then according to the unique conditions of micrographs in lithography experiments, an improved image edge extraction method is investigated.In this method Canny operator is selected as a basic algorithm, while the mathematical morphology is used in pre-processing for de-noising to reduce the uneven phenomenon.And an appropriate enhancement algorithm is used to enhance image contrast.Experimental results show that this method can extract the image edge from the micro-structure graphs effectively.

关键词： edge detection Canny operator mathematical morphology image enhancement

作者: Gong Shan-shan Li Mu-jun

作者单位: Department of Mathematics & Physics,Anhui University of Architecture,Hefei 230022,China Department of Precision Machinery & Instrumentation,University of Science and Technology of China,He

会议类型: 国际会议

会议名称: the 3nd International Conference on Digital Manufacturing & Automation (第三届数字制造与自动化国际会议(ICDMA 2012))

会议地点: 桂林

会议语种:英文

页码: 1109-1112

在线出版日期: 2012-08-01（万方平台首次上网日期，不代表论文的发表时间）