Influence of electron irradiation on the yellow luminescence in undoped n-GaN
The yellow luminescence (YL) band in unintentional doped n-GaN irradiated by 10 MeV electrons has been investigated by means ofphotoluminescence (PL) spectroscopy.The YL intensity increased after electron irradiation and thermal annealing,indicating that the deep level defects are created by electron irradiation and thermal annealing.These deep level point defect complexes arising from the irradiation introduced Ga vacancies and oxygen donor impurities are responsible for the YL.
GaN defects photoluminescence annealing
Limin Liang Xinjian Xie Qiuyan Hao Yuan Tian Weizhong Sun Caichi Liu
School of Materials Science and Engineering,Hebei University of Technology,Tianjin 300130,P.R.China
国际会议
沈阳
英文
125-128
2012-07-27(万方平台首次上网日期,不代表论文的发表时间)