Design and experimental study of deposition temperature control system in ultra-high vacuum

摘要：

　　Deposition temperature is a key factor influencing the growth morphology of thin-films,aiming at this phenomenon,a precise control system of deposition temperature in ultra-high vacuum is developed in the paper.It can realize accurate temperature control in a range of 150K to 450K during experiment by combination of resistance heating up and liquid helium cooling down strategies,which is benefit to further understand the temperature-depended mechanism of organic molecule thin-film growth.Besides,it is experimentally studied that the growth morphology ofp-6p molecules on a mica substrate is closely related to the substrate deposition temperature,indicating that the length of p-6p nano-fibers is proportional to the deposition temperature,while their distribution density is inversely proportional to the temperature.

关键词： deposition temperature control system thin-film growth ultra-high vacuum

作者: Zhidan Yan Lidong Sun Chunguang Hu Xiaotang Hu Peter Zeppenfeld

作者单位: College of Information & Control Engineering,China University of Petroleum(East China),266580 Qingda Institute für Experimentalphysik,Johannes Kepler Universit(a)t Linz,A-4040 Linz,Austria State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,300072 Tia

会议类型: 国际会议

会议名称: 2012 International Meeting on Opto-Electronics Engineering and Materials Research(OEMR2012)(2012光电工程与材料国际会议)

会议地点: 沈阳

会议语种:英文

页码: 564-568

在线出版日期: 2012-07-27（万方平台首次上网日期，不代表论文的发表时间）