Preparation of ZnO∶Zr thin films by sputtering Zn∶Zr targets
Transparent conductive ZnO∶Zr thin films with different thicknesses were fabricated on glass slides by DC reactive magnetron sputtering from Zn∶Zr targets consisting of Zn disk and Zr metallic chips in Ar+O2 mixture gas.X-ray diffraction,four-point probe measurements,UV-vis spectrophotometers and thin film thickness tester were employed to characterize the structure,electrical and optical properties of ZnO∶Zr films,respectively.The experimental investigations indicate that film thickness has an important effect on the crystal structure,optical and electrical properties of the deposited films.
ZnO∶Zr films DC reactive magnetron sputtering film thickness
Yuan Chang-kun
School of Science, Shandong Univiersity of Technology, Zibo, Shandong, 255049, PR China
国际会议
太原
英文
331-334
2012-06-23（万方平台首次上网日期，不代表论文的发表时间）