Effect of substrate temperature on high rate deposited ZnO∶Al films by magnetron sputtering
A series of ZnO∶Al (AZO) thin films was prepared on quartz at different substrate temperature using magnetron sputtering with high deposited rate of 67 nm/min.The structural,electrical and optical properties of these films were investigated as a function of substrate deposition temperature ranging from room temperature to 500 ℃.The surface micrograph of AZO film deposited at room temperature was measured by a scanning electron microscope (SEM) and an atomic force microscope (AFM).The results of X-ray diffraction (XRD) test show that all the films have a (002) preferential orientation.The best electrical property was obtained at 500 ℃,the resistivity was 9.044× 10-4 ohm·cm,and the corresponding carrier concentration and mobility were 3.379×1020/cm3 and 20.45 m2/Ns,respectively.Whats more,all the films show a high optical transmittance.
substrate temperature AZO films magnetron sputtering high rate
Weimin Li Huiying Hao
School of Material Science and Engineering, China University of Geosciences, Beijing, China
国际会议
厦门
英文
480-483
2012-01-04（万方平台首次上网日期，不代表论文的发表时间）