Effect of injection parameters on immersion liquid during wafer scanning

摘要：

　　Double patterning improves the development of immersion lithography,but it brings new challenges including the higher scanning velocity of wafer.In this paper,considering two typical injection types,the three-dimensional computational fluid dynamics model is developed to investigate the effect of injection parameters on immersion liquid during wafer scanning.By analyzing the velocity distribution of immersion flow and normal stress on the lens,the proper parameters of injection are proposed under the typical conditions,and the appropriate parameters which lead to effective renovation with low lens distortion are also given.

关键词： Immersion lithography Wafer Scanning Liquid Renovation Injection Parameters

作者: Hui Chen Qi Liu

作者单位: School of Mechanical Engineering and Automation,Fuzhou University,350108,China The State Key Laboratory of Fluid Power Transmission and Control,Zhejiang University,310027,China

会议类型: 国际会议

会议名称: the 2012 International Conference on Manufacturing Engineering and Automation (2012年制造工程与自动化国际会议(ICMEA2012))

会议地点: 广州

会议语种:英文

页码: 351-355

在线出版日期: 2012-11-16（万方平台首次上网日期，不代表论文的发表时间）