Microstructure, Interface and Hardness of Ti/TiN nanolayered coatings
The polycrystalline Ti/TiN multilayer films were deposited by magnetron sputtering.We investigated the effects of mixed discharge gas pressure,bias voltage and substrate temperature on the microstructural,interfacial,and mechanical properties of the polycrystalline Ti/TiN multilayer films.X-ray reflectivity and diffraction (XRR and XRD),and nanoindentation were used to characterize the structures and mechanical properties for the films.The period of multilayer,interface width and grain size decrease with increaseing of deposition pressure.The multilayer coating at floating voltage shows TiN (111),Ti2N (103),and TiN (200) preferred crystalline orientation,whlie those at other different substrate biases show only TiN (111) and Ti2N (103) preferred crystalline orientation.It was found that the hardness increased with increasing substrate temperature.This hardness enhancement was probably caused by the modulus difference in the interface between layer Ti and TiN or the preferred crystalline orientation TiN(111).
Sputtering Ti/TiN nano-multilayer Interface Hardness
Kiaoming Bai Weitao Zheng Xiujuan Guo Hui She
Basic Flight Training Base ,Air Force Aviation University, Changchun, 130022, PR China Department of Materials Science, Jilin University, Changchun, 130012, PR China
国际会议
广州
英文
645-650
2012-11-16（万方平台首次上网日期，不代表论文的发表时间）