Effect of oxygen content on structural and optical properties of single Cu20 film by reactive magnetron sputtering method
Cuprous oxide (Cu2O) thin films have been deposited on glass substrate by reactive magnetron sputtering method using Cu target and argon-oxygen gas atmosphere.Effect of oxygen flow rate on structural and optical properties of thin films has been discussed.The results of X-ray diffraction,UV-Vis spectrophotometry and atomic force micrograph indicated that the condition window for single Cu2O phase was about 3.8 to 4.4 sccm,and the optimum oxygen flow rate was found to be 4.2 sccm.The optical band gaps (Eg) of Cu2O film was determined by using transmittance vs.wavelength data.The optical band gap of Cu2O films slightly decreased from 2.46 to 2.40 eV with the increase of oxygen flow rate form 3.8 to 4.4 sccm.The Cu2O film formed at the oxygen flow rate of 4.2 sccm has an optical band gap of 2.43 eV
Cu2O reactive magnetron sputtering oxygen flow rate
Li Binbin Zhu Jianxun Chen Zhaofeng Shen Honglie Jiang Yun Hu Fangtian
College of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanj College of Material Science and Technology, Nanjing University of Aeronautics and Astronautics, Nanj Sinamo Science and Technology Company Limited, Nanjing, 210013, P.R.China
国际会议
上海
英文
222-222
2012-10-19（万方平台首次上网日期，不代表论文的发表时间）