Improvement of n/i Interface Layer Properties in Microcrystalline Silicon Solar Cell
Properties of n-i interface are critical for hydrogenated microcrystalline silicon (μc-Si:H) substrate-type (n-i-p) solar cell as it affects carrier collection,which is visible in the red response.Here,we report a remarkable improvement in visible-infrared responses upon hydrogen plasma treatment (HPT) of n/i interface.We demonstrate that hydrogen plasma treatment in the initial stage of a μc-Si:H i layer growth affects the red response of μc-Si:H solar cell.At the optimal deposition condition,18% higher short-circuit current density was obtained than its count part without using HPT.
microcrystalline silicon hydrogen plasma treatment solar cell
Xiangbo Zeng Jinyan Li Xiaobing Xie Ping Yang Hao Li Haibo Xiao Xiaodong Zhang Qiming Wang
State Key Laboratory on Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
国际会议
2012 Workshop on Inorganic Thin Films and Coatings (2012年无机薄膜与涂层学术研讨会)
桂林
英文
193-196
2012-07-16(万方平台首次上网日期,不代表论文的发表时间)